The Continuous Flow Ultrasonic Reactor (CFUR) integrates the cavitation effect of ultrasound with continuous flow chemistry, significantly enhancing the efficiency and controllability of nanomaterial synthesis, dispersion, and surface modification. Compared to traditional batch processing, it has notable advantages in operation mode, reaction outcome, and parameter regulation.
- The ultrasonic power ranges from 50-3000W
- Frequency: 20 kHz
- Temperature: -40 to 200℃ (external circulating bath)
- Pressure: 0.1-10 bar (controlled by the back pressure valve)
The advantages of using a continuous ultrasonic reactor for processing nano solutions
Precise control of nanoparticle size (Key parameters: Ultrasonic power, frequency, time)
- Ultrasonic power (50-2000 W) :
Low power (50-300 W) : Suitable for gentle dispersion (such as graphene exfoliation), avoiding excessive fragmentation.
High power (500-2000 W) : It can effectively reduce particle size (such as crushing micron-sized SiO₂ to 50-100 nm).
- Frequency selection (20 kHz - 1 MHz) :
Low frequency (20-50 kHz) : The cavitation bubbles are relatively large, which is suitable for the fragmentation of large particles (such as the dissociation of carbon nanotube bundles).
High frequency (400 kHz - 1 MHz) : Generates tiny cavitation bubbles, suitable for fine nanoemulsions (such as liposome preparation).
- Processing time (1-60 minutes) :
A short period of time (1-10 minutes) can prevent over-grinding, while a long period of time (30-60 minutes) can improve the dispersion stability.
Industrial case:
Nano-ceramic slurry: Continuous ultrasonic treatment at 20 kHz and 10 kW is adopted, with a production capacity of 200 L/h and particle uniformity (D90 <1 μm).
Nano pesticide suspension: Ultrasonic dispersion reduces the particle size of the active ingredient from 5 μm to 200 nm, and increases the bioavailability by 30%.
| Model | GK-10L | GK-20L | GKF-50L | GK-100L | GK-200L |
| Volume | 10L | 20L | 50L | 100L | 200L |
| Jackey Volume | ≈2L | ≈5L | ≈15L | ≈20L | ≈40L |
Equipment details
